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Quantum size effects in TiO(2) thin films grown by atomic layer deposition

We study the atomic layer deposition of TiO(2) by means of X-ray absorption spectroscopy. The Ti precursor, titanium isopropoxide, was used in combination with H(2)O on Si/SiO(2) substrates that were heated at 200 °C. The low growth rate (0.15 Å/cycle) and the in situ characterization permitted to f...

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Autori principali: Tallarida, Massimo, Das, Chittaranjan, Schmeisser, Dieter
Natura: Artigo
Lingua:Inglês
Pubblicazione: Beilstein-Institut 2014
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Accesso online:https://ncbi.nlm.nih.gov/pmc/articles/PMC3943868/
https://ncbi.nlm.nih.gov/pubmed/24605275
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3762/bjnano.5.7
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