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Optimization of the X-ray incidence angle in photoelectron spectrometers
The interplay between the angle-dependent X-ray reflectivity, X-ray absorption and the photoelectron attenuation length in the photoelectron emission process determines the optimal X-ray incidence angle that maximizes the photoelectron signal. Calculations in the wide VUV to the hard X-ray energy ra...
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
International Union of Crystallography
2013
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| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3943557/ https://ncbi.nlm.nih.gov/pubmed/23765292 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1107/S0909049513007747 |
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