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Absolute Measurements of Radiation Damage in Nanometer Thick Films
We address the problem of absolute measurements of radiation damage in films of nanometer thicknesses. Thin films of DNA (~ 2–160nm) are deposited onto glass substrates and irradiated with varying doses of 1.5 keV X-rays under dry N(2) at atmospheric pressure and room temperature. For each different...
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| Main Authors: | , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
2012
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3846537/ https://ncbi.nlm.nih.gov/pubmed/22562941 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1093/rpd/ncs036 |
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