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Black silicon with self-cleaning surface prepared by wetting processes
This paper reports on a simple method to prepare a hydrophobic surface on black silicon, which is fabricated by metal-assisted wet etching. To increase the reaction rate, the reaction device was placed in a heat collection-constant temperature type magnetic stirrer and set at room temperature. It wa...
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| 主要な著者: | , , , , , |
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| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
Springer
2013
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| 主題: | |
| オンライン･アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3765183/ https://ncbi.nlm.nih.gov/pubmed/23941184 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-8-351 |
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