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Optical assessment of silicon nanowire arrays fabricated by metal-assisted chemical etching

Silicon nanowire (SiNW) arrays were prepared on silicon substrates by metal-assisted chemical etching and peeled from the substrates, and their optical properties were measured. The absorption coefficient of the SiNW arrays was higher than that for the bulk silicon over the entire region. The absorp...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Kato, Shinya, Kurokawa, Yasuyoshi, Watanabe, Yuya, Yamada, Yasuharu, Yamada, Akira, Ohta, Yoshimi, Niwa, Yusuke, Hirota, Masaki
Format: Artigo
Sprache:Inglês
Veröffentlicht: Springer 2013
Schlagworte:
Online Zugang:https://ncbi.nlm.nih.gov/pmc/articles/PMC3669086/
https://ncbi.nlm.nih.gov/pubmed/23651912
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-8-216
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