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Central masking with bilateral cochlear implants

Across bilateral cochlear implants, contralateral threshold shift has been investigated as a function of electrode difference between the masking and probe electrodes. For contralateral electric masking, maximum threshold elevations occurred when the position of the masker and probe electrode was ap...

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Detalhes bibliográficos
Main Authors: Lin, Payton, Lu, Thomas, Zeng, Fan-Gang
Formato: Artigo
Idioma:Inglês
Publicado em: Acoustical Society of America 2013
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC3574098/
https://ncbi.nlm.nih.gov/pubmed/23363113
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1121/1.4773262
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