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Central masking with bilateral cochlear implants
Across bilateral cochlear implants, contralateral threshold shift has been investigated as a function of electrode difference between the masking and probe electrodes. For contralateral electric masking, maximum threshold elevations occurred when the position of the masker and probe electrode was ap...
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| 主要な著者: | , , |
|---|---|
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
Acoustical Society of America
2013
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| 主題: | |
| オンライン･アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3574098/ https://ncbi.nlm.nih.gov/pubmed/23363113 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1121/1.4773262 |
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