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Matrix-Assisted Dip-Pen Nanolithography (MA-DPN) and Polymer Pen Lithography (MA-PPL)
The controlled patterning of nanomaterials presents a major challenge to the field of nanolithography because of differences in size, shape and solubility of these materials. Matrix-assisted dip-pen nanolithography and polymer pen lithography provide a solution to this problem by utilizing a polymer...
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| Main Authors: | , , , , , , , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado: |
2010
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| Assuntos: | |
| Acceso en liña: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3517014/ https://ncbi.nlm.nih.gov/pubmed/19885890 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1002/smll.200901198 |
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