Matrix-Assisted Dip-Pen Nanolithography (MA-DPN) and Polymer Pen Lithography (MA-PPL)

The controlled patterning of nanomaterials presents a major challenge to the field of nanolithography because of differences in size, shape and solubility of these materials. Matrix-assisted dip-pen nanolithography and polymer pen lithography provide a solution to this problem by utilizing a polymer...

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Detalhes bibliográficos
Main Authors: Huang, Ling, Braunschweig, Adam B., Shim, Wooyoung, Qin, Lidong, Lim, Jong Kuk, Hurst, Sarah J., Huo, Fengwei, Xue, Can, Jang, Jae-Won, Mirkin, Chad A.
Formato: Artigo
Idioma:Inglês
Publicado em: 2010
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Article
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC3517014/
https://ncbi.nlm.nih.gov/pubmed/19885890
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1002/smll.200901198
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