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Effects of NIR annealing on the characteristics of al-doped ZnO thin films prepared by RF sputtering
Aluminum-doped zinc oxide (AZO) thin films have been deposited on glass substrates by employing radio frequency (RF) sputtering method for transparent conducting oxide applications. For the RF sputtering process, a ZnO:Al(2)O(3) (2 wt.%) target was employed. In this paper, the effects of near infrar...
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| Autori principali: | , |
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| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
Springer
2012
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| Soggetti: | |
| Accesso online: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3460783/ https://ncbi.nlm.nih.gov/pubmed/22673232 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-7-294 |
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