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Silicon-based photonic crystals fabricated using proton beam writing combined with electrochemical etching method
A method for fabrication of three-dimensional (3D) silicon nanostructures based on selective formation of porous silicon using ion beam irradiation of bulk p-type silicon followed by electrochemical etching is shown. It opens a route towards the fabrication of two-dimensional (2D) and 3D silicon-bas...
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| Hauptverfasser: | , , , , , , , , |
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| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
Springer
2012
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| Schlagworte: | |
| Online Zugang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3420235/ https://ncbi.nlm.nih.gov/pubmed/22824206 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-7-416 |
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