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The Influences of H(2)Plasma Pretreatment on the Growth of Vertically Aligned Carbon Nanotubes by Microwave Plasma Chemical Vapor Deposition

The effects of H(2)flow rate during plasma pretreatment on synthesizing the multiwalled carbon nanotubes (MWCNTs) by using the microwave plasma chemical vapor deposition are investigated in this study. A H(2)and CH(4)gas mixture with a 9:1 ratio was used as a precursor for the synthesis of MWCNT on...

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Bibliographic Details
Main Authors: Jian, Sheng-Rui, Chen, Yuan-Tsung, Wang, Chih-Feng, Wen, Hua-Chiang, Chiu, Wei-Ming, Yang, Chu-Shou
Format: Artigo
Language:Inglês
Published: Springer 2008
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Online Access:https://ncbi.nlm.nih.gov/pmc/articles/PMC3244812/
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1007/s11671-008-9141-5
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