Cargando...

The Influences of H(2)Plasma Pretreatment on the Growth of Vertically Aligned Carbon Nanotubes by Microwave Plasma Chemical Vapor Deposition

The effects of H(2)flow rate during plasma pretreatment on synthesizing the multiwalled carbon nanotubes (MWCNTs) by using the microwave plasma chemical vapor deposition are investigated in this study. A H(2)and CH(4)gas mixture with a 9:1 ratio was used as a precursor for the synthesis of MWCNT on...

Descrición completa

Gardado en:
Detalles Bibliográficos
Main Authors: Jian, Sheng-Rui, Chen, Yuan-Tsung, Wang, Chih-Feng, Wen, Hua-Chiang, Chiu, Wei-Ming, Yang, Chu-Shou
Formato: Artigo
Idioma:Inglês
Publicado: Springer 2008
Assuntos:
Acceso en liña:https://ncbi.nlm.nih.gov/pmc/articles/PMC3244812/
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1007/s11671-008-9141-5
Tags: Engadir etiqueta
Sen Etiquetas, Sexa o primeiro en etiquetar este rexistro!