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Maskless Plasmonic Lithography at 22 nm Resolution
Optical imaging and photolithography promise broad applications in nano-electronics, metrologies, and single-molecule biology. Light diffraction however sets a fundamental limit on optical resolution, and it poses a critical challenge to the down-scaling of nano-scale manufacturing. Surface plasmons...
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| Hoofdauteurs: | , , , , , , , , , , |
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| Formaat: | Artigo |
| Taal: | Inglês |
| Gepubliceerd in: |
Nature Publishing Group
2011
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| Onderwerpen: | |
| Online toegang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3240963/ https://ncbi.nlm.nih.gov/pubmed/22355690 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep00175 |
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