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M(3): Microscope-based maskless micropatterning with dry film photoresist
We present a maskless micropatterning system that utilizes a fluorescence microscope with programmable X-Y stage and dry film photoresist to realize feature sizes in the sub-millimeter range (40–700 μm). The method allows for flexible in-house maskless photolithography without a dedicated microfabri...
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| Main Authors: | , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
2011
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3171148/ https://ncbi.nlm.nih.gov/pubmed/21190086 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1007/s10544-010-9506-2 |
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