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Rolled-Up Nanotech: Illumination-Controlled Hydrofluoric Acid Etching of AlAs Sacrificial Layers

The effect of illumination on the hydrofluoric acid etching of AlAs sacrificial layers with systematically varied thicknesses in order to release and roll up InGaAs/GaAs bilayers was studied. For thicknesses of AlAs below 10 nm, there were two etching regimes for the area under illumination: one at...

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Detalhes bibliográficos
Main Authors: Costescu, Ruxandra M, Deneke, Christoph, Thurmer, Dominic J, Schmidt, Oliver G
Formato: Artigo
Idioma:Inglês
Publicado em: Springer 2009
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC2893847/
https://ncbi.nlm.nih.gov/pubmed/20652125
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1007/s11671-009-9421-8
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