Ultra-Smooth Nanostructured Diamond Films Deposited from He/H(2)/CH(4)/N(2) Microwave Plasmas

Addition of He to a high CH(4) content (10.7 vol%) H(2)/CH(4)/N(2) feedgas mixture for microwave plasma chemical vapor deposition produced hard (56–72 GPa), ultra-smooth nanostructured diamond films on Ti-6Al-4V alloy substrates. Upon increase in He content up to 71 vol%, root mean squared (RMS) sur...

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Main Authors: Konovalov, Valery V., Melo, Andrew, Catledge, Shane A., Chowdhury, Shafiul, Vohra, Yogesh K.
Formato: Artigo
Idioma:Inglês
Publicado: 2006
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Article
Acceso en liña:https://ncbi.nlm.nih.gov/pmc/articles/PMC2430513/
https://ncbi.nlm.nih.gov/pubmed/16573106
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1166/jnn.2006.045
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