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Ultra-Smooth Nanostructured Diamond Films Deposited from He/H(2)/CH(4)/N(2) Microwave Plasmas
Addition of He to a high CH(4) content (10.7 vol%) H(2)/CH(4)/N(2) feedgas mixture for microwave plasma chemical vapor deposition produced hard (56–72 GPa), ultra-smooth nanostructured diamond films on Ti-6Al-4V alloy substrates. Upon increase in He content up to 71 vol%, root mean squared (RMS) sur...
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| Main Authors: | , , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
2006
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC2430513/ https://ncbi.nlm.nih.gov/pubmed/16573106 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1166/jnn.2006.045 |
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