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Suppression of transient enhanced diffusion in sub-micron patterned silicon template by dislocation loops formation
We investigate the evolution of two dimensional transient enhanced diffusion (TED) of phosphorus in sub-micron scale patterned silicon template. Samples doped with low dose phosphorus with and without high dose silicon self-implantation, were annealed for various durations. Dopant diffusion is probe...
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| Main Authors: | , , |
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| Format: | Artigo |
| Language: | Inglês |
| Published: |
AIP Publishing LLC
2015-10-01
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| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/1.4934674 |
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