Effects of Negative Bias Voltage and Ratio of Nitrogen and Argon on the Structure and Properties of NbN Coatings Deposited by HiPIMS Deposition System

The NbNx>1 coatings were deposited on Si wafer and SUS 304 stainless steel substrates by a high power impulse magnetron sputtering (HiPIMS) system at various bias voltages and the ratios of nitrogen and argon (N2/Ar). By virtue of electron probe microanalysis (EPMA), X-ray diffraction pattern...

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Bibliographische Detailangaben
Hauptverfasser: Jicheng Ding, Tengfei Zhang, Haijuan Mei, Je Moon Yun, Seong Hee Jeong, Qimin Wang, Kwang Ho Kim
Format: Artigo
Sprache:Inglês
Veröffentlicht: MDPI AG 2017-12-01
Schriftenreihe:Coatings
Schlagworte:
NbNx&gt
1 coating
HiPIMS
bias voltage
N2/Ar ratio
microstructure
mechanical properties
Online Zugang:https://www.mdpi.com/2079-6412/8/1/10
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