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Semiconducting p-Type Copper Iron Oxide Thin Films Deposited by Hybrid Reactive-HiPIMS + ECWR and Reactive-HiPIMS Magnetron Plasma System
A reactive high-power impulse magnetron sputtering (r-HiPIMS) and a reactive high-power impulse magnetron sputtering combined with electron cyclotron wave resonance plasma source (r-HiPIMS + ECWR) were used for the deposition of p-type CuFe<i><sub>x</sub></i>O<i><sub...
में बचाया:
| मुख्य लेखकों: | , , , , , |
|---|---|
| स्वरूप: | Artigo |
| भाषा: | Inglês |
| प्रकाशित: |
MDPI AG
2020-03-01
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| श्रृंखला: | Coatings |
| विषय: | |
| ऑनलाइन पहुंच: | https://www.mdpi.com/2079-6412/10/3/232 |
| टैग : |
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