Atmospheric Pressure Plasma Deposition of Organosilicon Thin Films by Direct Current and Radio-frequency Plasma Jets

Thin film deposition with atmospheric pressure plasmas is highly interesting for industrial demands and scientific interests in the field of biomaterials. However, the engineering of high-quality films by high-pressure plasmas with precise control over morphology and surface chemistry still poses a...

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Detalhes bibliográficos
Main Authors: Iryna Kuchakova, Maria Daniela Ionita, Eusebiu-Rosini Ionita, Andrada Lazea-Stoyanova, Simona Brajnicov, Bogdana Mitu, Gheorghe Dinescu, Mike De Vrieze, Uroš Cvelbar, Andrea Zille, Christophe Leys, Anton Yu Nikiforov
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI AG 2020-03-01
Colecção:Materials
Assuntos:
plasma deposition
atmospheric pressure plasma
thin film
organosilicon films
organosilicon precursors
Acesso em linha:https://www.mdpi.com/1996-1944/13/6/1296
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