Atmospheric Pressure Plasma Deposition of Organosilicon Thin Films by Direct Current and Radio-frequency Plasma Jets

Por Iryna Kuchakova, Maria Daniela Ionita, Eusebiu-Rosini Ionita, Andrada Lazea-Stoyanova, Simona Brajnicov, Bogdana Mitu, Gheorghe Dinescu, Mike De Vrieze, Uroš Cvelbar, Andrea Zille, Christophe Leys, Anton Yu Nikiforov
Publicado em 2020-03-01