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Performance of Cu–Ag Thin Films as Diffusion Barrier Layer

It is well-known that Cu–Sn intermetallic compounds are easily produced during reflow process and result in poor reliability of solder bump. Recently, amorphous metallic films have been considered to be the most effective barrier layer because of the absence of grain boundaries and immiscibility wit...

Deskribapen osoa

Gorde:
Xehetasun bibliografikoak
Egile Nagusiak: Po-Hsien Sung, Tei-Chen Chen
Formatua: Artigo
Hizkuntza:Inglês
Argitaratua: MDPI AG 2020-11-01
Saila:Coatings
Gaiak:
Sarrera elektronikoa:https://www.mdpi.com/2079-6412/10/11/1087
Etiketak: Etiketa erantsi
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