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Indium Saving Indium Tin Oxide Thin Films Deposited by Sputtering at Room Temperature
<p><span>Indium saving indium tin oxide ITO thin films have been deposited using a sputtering deposition technique in pure Ar and in mixed argon-oxygen atmosphere at room temperature. A transmittance value of more than 85 % in the visible region of the spectrum and a resistivity of 2420...
Tallennettuna:
| Päätekijät: | , , , , , |
|---|---|
| Aineistotyyppi: | Artigo |
| Kieli: | Inglês |
| Julkaistu: |
Vasyl Stefanyk Precarpathian National University
2018-01-01
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| Sarja: | Фізика і хімія твердого тіла |
| Linkit: | http://journals.pu.if.ua/index.php/pcss/article/view/2253 |
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