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Metastability problems in amorphous silicon

The results of study of the in uence of boron and phosphorous doping and hydrogen content on transport prop- erties and thermally induced metastability of LPCVD a-Si are reported. The thermally induced metastability has been observed in both unhydrogenated and hydrogenated P-doped a-Si films. Metas...

Ausführliche Beschreibung

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Bibliografische Detailangaben
Hauptverfasser: Stanisław M. Pietruszko, Marek Kostana
Format: Artigo
Sprache:Inglês
Veröffentlicht: National Institute of Telecommunications 2001-03-01
Schriftenreihe:Journal of Telecommunications and Information Technology
Schlagworte:
Online-Zugang:https://jtit.pl/jtit/article/view/36
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