A stable monoclinic variant and resultant robust ferroelectricity in single-crystalline hafnia-based films
Abstract The ferroelectricity in nanoscale HfO2-based films enables their applications more promising than that of the perovskite oxides, taking into account the easy compatibility with the modern silicon-based semiconductor technology. However, the well-known polar orthorhombic phase is thermodynam...
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| Główni autorzy: | , , , , , , , |
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| Format: | Artigo |
| Język: | Inglês |
| Wydane: |
Nature Portfolio
2025-10-01
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| Seria: | Nature Communications |
| Dostęp online: | https://doi.org/10.1038/s41467-025-63907-z |
| Etykiety: |
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