Characterization upon electrical hysteresis and thermal diffusion of TiAl<sub>3</sub>O<sub> <it>x </it> </sub>dielectric film
<p>Abstract</p> <p>In this paper, we have investigated the electrical properties of TiAl<sub>3</sub>O<sub> <it>x </it> </sub>film as electrical gate insulator deposited by pulsed laser deposition and presented a simple method to describe the thermal diffusion behaviors of metal atoms at TiAl<sub>3</...
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| Autors principals: | , |
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| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
SpringerOpen
2011-01-01
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| Col·lecció: | Nanoscale Research Letters |
| Matèries: | |
| Accés en línia: | http://www.nanoscalereslett.com/content/6/1/557 |
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