Characterization upon electrical hysteresis and thermal diffusion of TiAl<sub>3</sub>O<sub> <it>x </it> </sub>dielectric film
<p>Abstract</p> <p>In this paper, we have investigated the electrical properties of TiAl<sub>3</sub>O<sub> <it>x </it> </sub>film as electrical gate insulator deposited by pulsed laser deposition and presented a simple method to describe the thermal diffusion behaviors of metal atoms at TiAl<sub>3</...
Gorde:
| Egile Nagusiak: | , |
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| Formatua: | Artigo |
| Hizkuntza: | Inglês |
| Argitaratua: |
SpringerOpen
2011-01-01
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| Saila: | Nanoscale Research Letters |
| Gaiak: | |
| Sarrera elektronikoa: | http://www.nanoscalereslett.com/content/6/1/557 |
| Etiketak: |
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