Micro-Nano Machining TiO₂ Patterns without Residual Layer by Unconventional Imprinting

Usually, the residual layer remains after patterning TiO₂ sol. The existence of the TiO₂ residual layer in the non-pattern region affects its application in microelectronic devices. Here, a simple method, based on room-temperature imprinting, to fabricate a residual-free TiO<su...

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Autori principali:	Zhoufang Zeng, Gang Shi, Florian Ion Tiberiu Petrescu, Liviu Marian Ungureanu, Ying Li
Natura:	Artigo
Lingua:	Inglês
Pubblicazione:	MDPI AG 2021-10-01
Serie:	Applied Sciences
Soggetti:	TiO<sub>2</sub> PMMA residual imprinting patterns arrays
Accesso online:	https://www.mdpi.com/2076-3417/11/21/10097
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