Manipulation Mask Manufacturer for Arbitrary-Scale Super-Resolution Images

In the field of Image Manipulation Localization (IML), the limited quantity and poor quality of existing datasets hinder model generalization and robustness. To address this, a Manipulation Mask Manufacturer (MMM) framework that integrates a super-resolution module to mitigate clarity discrepancies...

पूर्ण विवरण

ग्रंथसूची विवरण

मुख्य लेखक:	XU Xiong, YANG Xinyu, ZHU Xuekang, DU Bo, SU Lei, TONG Bingkui, LEI Zeyu, ZHOU Jizhe
स्वरूप:	Artigo
भाषा:	Inglês
प्रकाशित:	Editorial Office of Computer Engineering 2025-12-01
श्रृंखला:	Jisuanji gongcheng
विषय:	image manipulation localization (iml)|dataset of visual media|dataset generation|arbitrary-scale|super-resolution
ऑनलाइन पहुंच:	https://www.ecice06.com/fileup/1000-3428/PDF/20251225.pdf
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