Manipulation Mask Manufacturer for Arbitrary-Scale Super-Resolution Images
In the field of Image Manipulation Localization (IML), the limited quantity and poor quality of existing datasets hinder model generalization and robustness. To address this, a Manipulation Mask Manufacturer (MMM) framework that integrates a super-resolution module to mitigate clarity discrepancies...
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| Format: | Artigo |
| Jezik: | Inglês |
| Izdano: |
Editorial Office of Computer Engineering
2025-12-01
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| Serija: | Jisuanji gongcheng |
| Teme: | |
| Online dostop: | https://www.ecice06.com/fileup/1000-3428/PDF/20251225.pdf |
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