Repair of Fused Silica Damage Using Selective Femtosecond Laser-Induced Etching
Timely repair of fused silica damage ensures the stable operation of high-power laser systems. In the traditional repair process, the material nearby the damaged area is gradually ablated with CO<sub>2</sub> or femtosecond laser. Subsequently, homogenization and residual stress removal are required...
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| Principais autores: | , , , , , , , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
MDPI AG
2023-02-01
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| coleção: | Crystals |
| Assuntos: | |
| Acesso em linha: | https://www.mdpi.com/2073-4352/13/2/309 |
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