Repair of Fused Silica Damage Using Selective Femtosecond Laser-Induced Etching

Timely repair of fused silica damage ensures the stable operation of high-power laser systems. In the traditional repair process, the material nearby the damaged area is gradually ablated with CO₂ or femtosecond laser. Subsequently, homogenization and residual stress removal are required...

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Detalhes bibliográficos

Principais autores:	Zhenhua Fang, Jing Chen, Xiaolong Jiang, Chuanchao Zhang, Lijuan Zhang, Jingxuan Wang, Xiaoyu Luan, Haijun Wang, Qiankun Wu, Wei Liao
Formato:	Artigo
Idioma:	Inglês
Publicado em:	MDPI AG 2023-02-01
Colecção:	Crystals
Assuntos:	damage repair modification selective femtosecond laser-induced etching
Acesso em linha:	https://www.mdpi.com/2073-4352/13/2/309
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