Initiation of Polarized State in the Tantalum Oxide Thin Films Grown by Magnetron Sputtering on a Substrate of Monocrystalline Silicon (100) Followed by Argon and Oxygen Ions

The pictures of the induced state and the surface potential distribution in thin films of tantalum oxide produced by magnetron sputtering onto a substrate of monocrystalline silicon (100) followed by low energy argon and oxygen ions was investigated by atomic force microscopy in spreading resistanc...

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מידע ביבליוגרפי

Principais autores:	I.Yu. Goncharov, D.A. Kolesnikov, A.V. Zykova, V.I. Safonov
פורמט:	Artigo
שפה:	Inglês
יצא לאור:	Sumy State University 2015-12-01
סדרה:	Журнал нано- та електронної фізики
נושאים:	Thin films of tantalum oxide Magnetron sputtering Kelvin probe microscopy Polarization and depolarizatio
גישה מקוונת:	http://jnep.sumdu.edu.ua/download/numbers/2015/4/articles/jnep_2015_V7_04074.pdf
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