Initiation of Polarized State in the Tantalum Oxide Thin Films Grown by Magnetron Sputtering on a Substrate of Monocrystalline Silicon (100) Followed by Argon and Oxygen Ions
The pictures of the induced state and the surface potential distribution in thin films of tantalum oxide produced by magnetron sputtering onto a substrate of monocrystalline silicon (100) followed by low energy argon and oxygen ions was investigated by atomic force microscopy in spreading resistanc...
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| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
Sumy State University
2015-12-01
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| Schriftenreihe: | Журнал нано- та електронної фізики |
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| Online-Zugang: | http://jnep.sumdu.edu.ua/download/numbers/2015/4/articles/jnep_2015_V7_04074.pdf |
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