Kinetic study of negative dry-film photoresists
Thanks to the differential photocalorimetry technique DPC, characteristics of negative photoresists (Riston® PM 215 and Riston® MM 140, 1 mil or 25.4 µm thickness) to be developed in nonorganic aqueous medium) used in microlithography are highlighted. The photoreactivity (being evaluated by DPC) of...
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| Formato: | Artigo |
|---|---|
| Idioma: | Inglês |
| Publicado em: |
Budapest University of Technology and Economics
2007-10-01
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| coleção: | eXPRESS Polymer Letters |
| Assuntos: | |
| Acesso em linha: | http://www.expresspolymlett.com/letolt.php?file=EPL-0000357&mi=cd |
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