Polarization camera based fringe locking system for scanning beam interference lithography

A fringe displacement during the exposure process in scanning beam interference lithography (SBIL) systems leads to wavefront errors in linear gratings. The exact orientation of the fringe pattern along the scan direction is also essential for the production of high-quality gratings. In this paper,...

תיאור מלא

מידע ביבליוגרפי

Principais autores:	Treptow Kevin, Rühle Josias, Wu Hansen, Pruß Christof, Ortlepp Ingo, Schober Christian, Haist Tobias, Sawodny Oliver, Manske Eberhard, Kissinger Thomas, Reichelt Stephan
פורמט:	Artigo
שפה:	Inglês
יצא לאור:	EDP Sciences 2026-01-01
סדרה:	Journal of the European Optical Society-Rapid Publications
נושאים:	laser lithography gratings diffractive elements
גישה מקוונת:	https://jeos.edpsciences.org/articles/jeos/full_html/2026/01/jeos20250078/jeos20250078.html
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