Polarization camera based fringe locking system for scanning beam interference lithography
A fringe displacement during the exposure process in scanning beam interference lithography (SBIL) systems leads to wavefront errors in linear gratings. The exact orientation of the fringe pattern along the scan direction is also essential for the production of high-quality gratings. In this paper,...
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| Główni autorzy: | , , , , , , , , , , |
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| Format: | Artigo |
| Język: | Inglês |
| Wydane: |
EDP Sciences
2026-01-01
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| Seria: | Journal of the European Optical Society-Rapid Publications |
| Hasła przedmiotowe: | |
| Dostęp online: | https://jeos.edpsciences.org/articles/jeos/full_html/2026/01/jeos20250078/jeos20250078.html |
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