Structural,Morphology and PL Properties of ZnO Film Deposition on Porous Silicon
ZnO thin film was deposited on glass and porous silicon by spray pyrolysis technology with fixed parameters consist (substrate temperature 400Co, deposition rate 100nm/min), and the measurements of structural (XRD), morphology (AFM) and photoluminesces (PL) refer to good growth of ZnO after using po...
Gorde:
| Egile Nagusiak: | , |
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| Formatua: | Artigo |
| Hizkuntza: | Inglês |
| Argitaratua: |
Unviversity of Technology- Iraq
2014-06-01
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| Saila: | Engineering and Technology Journal |
| Gaiak: | |
| Sarrera elektronikoa: | https://etj.uotechnology.edu.iq/article_105264_387bf7ee062740fec5e29e22c3b296f9.pdf |
| Etiketak: |
Etiketarik gabe, Izan zaitez lehena erregistro honi etiketa jartzen!
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