Arsenic Exposure and Methylation Efficiency in Relation to Oxidative Stress in Semiconductor Workers

This study examined associations between oxidative stress and arsenic (As) exposure and methylation efficiency in semiconductor workers. An As-exposed group (n = 427) and a control group (n = 91) were included. The As-exposure group (n = 427) included 149 maintenance staff members and 278 production...

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Detalhes bibliográficos

Principais autores:	Chih-Hong Pan, Ching-Yu Lin, Ching-Huang Lai, Hueiwang Anna Jeng
Formato:	Artigo
Idioma:	Inglês
Publicado em:	MDPI AG 2020-05-01
Colecção:	Atmosphere
Assuntos:	arsenic inorganic arsenic metabolites methylation efficiency semiconductor workers oxidative stress
Acesso em linha:	https://www.mdpi.com/2073-4433/11/5/464
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