Arsenic Exposure and Methylation Efficiency in Relation to Oxidative Stress in Semiconductor Workers

This study examined associations between oxidative stress and arsenic (As) exposure and methylation efficiency in semiconductor workers. An As-exposed group (n = 427) and a control group (n = 91) were included. The As-exposure group (n = 427) included 149 maintenance staff members and 278 production...

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Главные авторы:	Chih-Hong Pan, Ching-Yu Lin, Ching-Huang Lai, Hueiwang Anna Jeng
Формат:	Artigo
Язык:	Inglês
Опубликовано:	MDPI AG 2020-05-01
Серии:	Atmosphere
Предметы:	arsenic inorganic arsenic metabolites methylation efficiency semiconductor workers oxidative stress
Online-ссылка:	https://www.mdpi.com/2073-4433/11/5/464
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