Shadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography

Highlights The submicron light sources are realized only by the normal UV photolithography process, enabling the realization of submicron light sources with arbitrary patterns. A novel and efficient method for the fabrication of submicron light sources is proposed, termed shadow-assisted sidewall em...

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Autors principals: Junlong Li, Yanmin Guo, Kun Wang, Wei Huang, Hao Su, Wenhao Li, Xiongtu Zhou, Yongai Zhang, Tailiang Guo, Chaoxing Wu
Format: Artigo
Idioma:Inglês
Publicat: SpringerOpen 2025-04-01
Col·lecció:Nano-Micro Letters
Matèries:
Submicron light source
Quantum dot
Photoluminescence
Photolithography
Shadow-assisted sidewall emission
Accés en línia:https://doi.org/10.1007/s40820-025-01737-w
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