Shadow-Assisted Sidewall Emission for Achieving Submicron Linewidth Light Source by Using Normal UV Photolithography

Highlights The submicron light sources are realized only by the normal UV photolithography process, enabling the realization of submicron light sources with arbitrary patterns. A novel and efficient method for the fabrication of submicron light sources is proposed, termed shadow-assisted sidewall em...

ver descrição completa

Na minha lista:
Detalhes bibliográficos
Main Authors: Junlong Li, Yanmin Guo, Kun Wang, Wei Huang, Hao Su, Wenhao Li, Xiongtu Zhou, Yongai Zhang, Tailiang Guo, Chaoxing Wu
Formato: Artigo
Idioma:Inglês
Publicado em: SpringerOpen 2025-04-01
Colecção:Nano-Micro Letters
Assuntos:
Submicron light source
Quantum dot
Photoluminescence
Photolithography
Shadow-assisted sidewall emission
Acesso em linha:https://doi.org/10.1007/s40820-025-01737-w
Tags: Adicionar Tag
Sem tags, seja o primeiro a adicionar uma tag!

Registos relacionados