Investigation of Morphological, Optical, and Dielectric Properties of RF Sputtered WO_x Thin Films for Optoelectronic Applications

Tungsten oxide (WO_x) thin films were synthesized through the RF magnetron sputtering method by varying the sputtering power from 30 W to 80 W. Different investigations have been conducted to evaluate the variation in different morphological, optical, and dielectric properties with the spu...

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Prif Awduron:	Samiya Mahjabin, Md. Mahfuzul Haque, K. Sobayel, Vidhya Selvanathan, M. S. Jamal, M. S. Bashar, Munira Sultana, Mohammad Ismail Hossain, Md. Shahiduzzaman, Merfat Algethami, Sami S. Alharthi, Nowshad Amin, Kamaruzzaman Sopian, Md. Akhtaruzzaman
Fformat:	Artigo
Iaith:	Inglês
Cyhoeddwyd:	MDPI AG 2022-10-01
Cyfres:	Nanomaterials
Pynciau:	tungsten oxide sputtering RF magnetron sputtering metal oxide photovoltaic optoelectronics
Mynediad Ar-lein:	https://www.mdpi.com/2079-4991/12/19/3467
Tagiau:	Ychwanegu Tag Dim Tagiau, Byddwch y cyntaf i dagio'r cofnod hwn!