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Barrier Inhomogeneity of Schottky Diode on Nonpolar AlN Grown by Physical Vapor Transport

An aluminum nitride (AlN) Schottky barrier diode (SBD) was fabricated on a nonpolar AlN crystal grown on tungsten substrate by physical vapor transport. The Ni/Au&#x2013;AlN SBD features a low ideality factor <inline-formula> <tex-math notation="LaTeX">${n}$ </tex-math></inline-formula> of 3.3 and a...

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Detalles Bibliográficos
Principais autores: Qin Zhou, Honglei Wu, Hui Li, Xi Tang, Zuoyan Qin, Dan Dong, Yan Lin, Chengjin Lu, Ran Qiu, Ruisheng Zheng, Jiannong Wang, Baikui Li
Formato: Artigo
Idioma:Inglês
Publicado: IEEE 2019-01-01
Series:IEEE Journal of the Electron Devices Society
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Acceso en liña:https://ieeexplore.ieee.org/document/8737747/
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