Observation of tantalum deposition and growth on TiB2 and ZrB2 from PISCES-RF deuterium and helium plasma exposures

Deuterium and helium plasma exposures on bulk TiB2 and ZrB2 samples were performed using the PISCES-RF linear plasma device. 40 and 90 eV deuterium ion plasma exposures were performed at 240 and 800 °C sample temperatures, and 80 eV helium ion plasma exposures were performed at 800 °C sample tempera...

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Autores principales:	L. Nuckols, C.M. Parish, M.J. Baldwin, H.M. Meyer, III, D. Nishijima, M.I. Patino, J. Rapp
Formato:	Artigo
Lenguaje:	Inglês
Publicado:	Elsevier 2024-06-01
Colección:	Nuclear Materials and Energy
Materias:	Plasma-material interaction Ultra-high temperature in ceramics Linear plasma devices PISCES-RF
Acceso en línea:	http://www.sciencedirect.com/science/article/pii/S2352179124000644
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