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Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO<sub>4</sub> Thin Films

Thin films of ZnWO<sub>4</sub>, a promising photocatalytic and scintillator material, were deposited for the first time using a reactive dual magnetron sputtering procedure. A ZnO target was operated using an RF signal, and a W target was operated using a DC signal. The power on the ZnO target was c...

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Principais autores: Yannick Hermans, Faraz Mehmood, Kerstin Lakus-Wollny, Jan P. Hofmann, Thomas Mayer, Wolfram Jaegermann
格式: Artigo
語言:Inglês
出版: MDPI AG 2021-04-01
叢編:Surfaces
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在線閱讀:https://www.mdpi.com/2571-9637/4/2/13
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