Reactive Dual Magnetron Sputtering: A Fast Method for Preparing Stoichiometric Microcrystalline ZnWO<sub>4</sub> Thin Films
Thin films of ZnWO<sub>4</sub>, a promising photocatalytic and scintillator material, were deposited for the first time using a reactive dual magnetron sputtering procedure. A ZnO target was operated using an RF signal, and a W target was operated using a DC signal. The power on the ZnO target was c...
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| Автори: | , , , , , |
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| Формат: | Artigo |
| Мова: | Inglês |
| Опубліковано: |
MDPI AG
2021-04-01
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| Серія: | Surfaces |
| Предмети: | |
| Онлайн доступ: | https://www.mdpi.com/2571-9637/4/2/13 |
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