Semi-Supervised Learning Under Extreme Class Imbalance in Wafer Bin Map Defect Pattern Classification
The semiconductor industry faces significant challenges in wafer quality assessment due to the increasing complexity of device fabrication and the rise in inline defects and circuit failures. As manufacturing processes advance, conventional manual analysis of wafer bin maps (WBMs) has become impract...
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| Hlavní autoři: | , , |
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| Médium: | Artigo |
| Jazyk: | Inglês |
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IEEE
2026-01-01
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| Edice: | IEEE Access |
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| On-line přístup: | https://ieeexplore.ieee.org/document/11368897/ |
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